OVERLAY VERNIER OF A SEMICONDUCTOR DEVICE, CAPABLE OF PREVENTING READING ERRORS BY IMPROVING THE ACCURACY OF OVERLAY

摘要

PURPOSE: An overlay vernier of a semiconductor device is provided to improve yield of a semiconductor device by accurately measuring the overlay by using the signal of uppermost etch part and the signal of a vernier.;CONSTITUTION: A main vernier(200) of stepped shape is provided. A sub vernier(204) is formed on the oxide film. The sub vernier is formed to expose only the top etch of main vernier to outside. The end of the sub vernier covers the second stairs of the main vernier.;COPYRIGHT KIPO 2011