I-LINE CHEMICALLY AMPLIFIED POSITIVE PHOTO-RESIST COMPOSITION FOR A MICROLENS AND THE MICROLENS FABRICATED USING THE SAME, INCLUDING THE SUPERIOR SURFACE ROUGHNESS

摘要

PURPOSE: An i-line chemically amplified positive photo-resist composition for a microlens and the microlens fabricated using the same are provided to easily adjust the curvature radius of the microlens by adjusting the composition and the contents of microlens compositions.;CONSTITUTION: A first resin includes a first structural unit represented by chemical formula 1, a second structural unit represented by chemical formula 2, and a third structural unit represented by chemical formula 3. A second resin includes a fourth structural unit represented by chemical formula 4, and the weight-average molecular weight of the second resin is between 5000 and 20000. A photoacid generator includes a compound represented by chemical formula 5. A quencher is prepared.;COPYRIGHT KIPO 2011