I-LINE CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR A MICROLEN, WHICH IS COMPOSED OF A POLY(HYDROXYSTYRENE)-BASED RESIN, AN ACRYLATE-BASED RESIN, A PHTOACID GENERATOR, AND THE MICROLENS WHICH IS MANUFACTURED USING THE SAME

摘要

PURPOSE: An i-line chemically amplified positive photoresist composition and the microlens which is manufactured using the same are provided to obtain excellent resolution and transmittance, to easily control the radius of curvature of the lens, and to have superior surface roughness of the lens curvature.;CONSTITUTION: An i-line chemically amplified positive photoresist composition includes a structure unit which is marked as a chemical formula 1 and a structure unit which is marked as a chemical formula 2. The composition comprises: a resin having a glass transition temperature of 150 ~ 170°C and an average molecular weight of 9,000 ~ 11,000; an photoacid generator including compounds which are marked as a chemical formula 3 and a chemical formula 4; and a quencher.;COPYRIGHT KIPO 2010