首页> 外国专利> FIELD EFFECT TRANSISTOR HAVING AG DOPED ZNO NANOWIRE AND METHOD FOR MANUFACTURING THE SAME

FIELD EFFECT TRANSISTOR HAVING AG DOPED ZNO NANOWIRE AND METHOD FOR MANUFACTURING THE SAME

机译:具有掺杂的Zno纳米线的场效应晶体管及其制造方法

摘要

PURPOSE: A field effect transistor including an Ag doped ZnO nano wire and a manufacturing method thereof are provided to obtain high electric property by controlling the doping and composition of a nano wire. CONSTITUTION: A gate insulation layer(12) is formed on a substrate(11). A source electrode(14) and a drain electrode(15) are positioned on the gate insulation layer. The source electrode and the drain electrode include a first layer made of titanium and a second layer made of conductive materials. A nano wire(13) is positioned between the source electrode and the drain electrode. The nano wire includes Ag doped ZnO.
机译:目的:提供一种包括Ag掺杂的ZnO纳米线的场效应晶体管及其制造方法,以通过控制纳米线的掺杂和组成来获得高电性能。组成:栅极绝缘层(12)形成在基板(11)上。源电极(14)和漏电极(15)位于栅绝缘层上。源电极和漏电极包括由钛制成的第一层和由导电材料制成的第二层。纳米线(13)位于源电极和漏电极之间。纳米线包括Ag掺杂的ZnO。

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