首页> 外国专利> INSPECTION METHOD OF PHOTO MASK, MANUFACTURING METHOD OF PHOTO MASK, MANUFACTURING METHOD OF ELECTRONIC DEVICE, TEST MASK AND TEST MASK SET

INSPECTION METHOD OF PHOTO MASK, MANUFACTURING METHOD OF PHOTO MASK, MANUFACTURING METHOD OF ELECTRONIC DEVICE, TEST MASK AND TEST MASK SET

机译:光罩的检查方法,光罩的制造方法,电子设备的制造方法,试验罩和试验罩组

摘要

PURPOSE: A method for inspecting a photo mask, a method for manufacturing a photo mask, a method for manufacturing an electronic part, a test mask, and a test mask set are provided to use a support unit with a mask which supports a photo mask to distribute the weight of the photo mask to support points, thereby preventing damage of the photo mask. CONSTITUTION: A photo mask(3) is supported by a support unit(3a) with a mask. A light source(1) uses one of a halogen lamp, a metal halide lamp, and a UHP lamp. An illumination optical system(2) irradiates inspection light to the photo mask supported by the support unit. The illumination optical system includes an iris device(2a) to vary the number of openings. The inspection light irradiated to the photo mask is transmitted through the photo mask and incident on an objective lens system(4).
机译:用途:提供一种用于检查光掩模的方法,一种用于制造光掩模的方法,一种用于制造电子零件的方法,一种测试掩模以及一种测试掩模套件,以使用带有支撑光掩模的带有掩模的支撑单元。将光罩的重量分配到支撑点,从而防止光罩的损坏。组成:光罩(3)由带有光罩的支撑单元(3a)支撑。光源(1)使用卤素灯,金属卤化物灯和UHP灯中的一种。照明光学系统(2)将检查光照射到由支撑单元支撑的光掩模。照明光学系统包括可变开口的虹膜装置(2a)。照射到光罩的检查光透过光罩,入射到物镜系统(4)。

著录项

  • 公开/公告号KR20110027731A

    专利类型

  • 公开/公告日2011-03-16

    原文格式PDF

  • 申请/专利权人 HOYA CORPORATION;

    申请/专利号KR20110009719

  • 发明设计人 NAKANISHI KATSUHIKO;YOSHIDA KOICHIRO;

    申请日2011-01-31

  • 分类号H01L21/66;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:20

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号