INSPECTION METHOD OF PHOTO MASK, MANUFACTURING METHOD OF PHOTO MASK, MANUFACTURING METHOD OF ELECTRONIC DEVICE, TEST MASK AND TEST MASK SET

摘要

The test mask is exposed and developed using a test mask to obtain a test resist pattern, and the test mask is measured to obtain actual exposure test pattern data. Further, light test is performed on the test mask under predetermined optical conditions, and light transmission test pattern data is obtained based on the light transmission pattern obtained by obtaining the light transmission pattern by the imaging means. Based on the light transmission pattern obtained by comparing the actual exposure test pattern data with the light transmission test pattern data, setting optical conditions based on the comparison result, and irradiating light to the photomask to be inspected. The mask is inspected.;Photomask, gray tone mask, gate insulating film, wavelength selective filter, light transmitting part