FORMING METHOD OF RETICLE PATTERN FOR DOUBLE PATTERING, USING A OVERLAP METHOD IN MANUFACTURING A RETICLE HAVING X AND Y-AXIS PATTERN

摘要

PURPOSE: A forming method of reticle pattern for double pattering is provided to improve resolution by dividing a circuit design having high patter density into two photo layers or reticle and exposing them.;CONSTITUTION: In a forming method of reticle pattern for double pattering, a pattern forming periodically identical patterns is detected from a semiconductor design database. The detected pattern is divided into two parts to define a first pattern and a second pattern which are repeatedly alternated. A common area is formed by the expansion pattern of first and second patterns. A first reticle for double patterning is formed by the common area and the first pattern. A second reticle for double patterning is formed by the common area and the second pattern.;COPYRIGHT KIPO 2011