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PROCESS MODULE, A SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE TRANSFER METHOD, CAPABLE OF REDUCING A RETURN TIME BY FORMING A RETURN PATH SHORT

机译:程序模块,基板处理装置和基板传输方法,能够通过形成返回路径缩短来减少返回时间

摘要

PURPOSE: A process module, a substrate processing apparatus and a substrate transfer method are provided to improve throughput by arranging a plurality of process chambers to be adjacent to one transfer chamber.;CONSTITUTION: In a process module, a substrate processing apparatus and a substrate transfer method, a substrate transfer apparatus is arranged in a buffer chamber. The substrate transfer apparatus includes substrate supports(15U,15M,15D) and a rotation shaft. The rotation shaft independently rotates the substrate supports. A susceptor in which a wafer is loaded is arranged in a process chamber. A gate valve(GV2) is arranged between a buffer chamber and a process chamber.;COPYRIGHT KIPO 2011
机译:目的:提供一种处理模块,一种基板处理设备和一种基板传送方法,以通过将多个处理室布置成与一个传送室相邻来提高生产率。传送方法,将基板传送设备布置在缓冲室内。基板传送装置包括基板支撑件(15U,15M,15D)和旋转轴。旋转轴独立地旋转基板支撑件。在处理室内配置有载置有晶片的基座。缓冲室和处理室之间装有闸阀(GV2)。;COPYRIGHT KIPO 2011

著录项

  • 公开/公告号KR20110033777A

    专利类型

  • 公开/公告日2011-03-31

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号KR20100085263

  • 发明设计人 IIZUKA YOJI;

    申请日2010-09-01

  • 分类号H01L21/02;H01L21/677;

  • 国家 KR

  • 入库时间 2022-08-21 17:52:15

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