APPARATUS FOR ALIGNING MASK AND A METHOD FOR ALIGNING A MASK, CAPABLE OF SUPPRESSING THE INCREASE IN MANUFACTURING COSTS AND A TIMES IN REALIGNMENT OF THE MASK

摘要

PURPOSE: An apparatus for aligning mask and a method for aligning a mask are provided to prevent the alignment error of a mask to a substrate by comparing each alignment state and using corrected alignment value.;CONSTITUTION: In an apparatus for aligning mask and a method for aligning a mask, a mask is arranged on a first substrate and is firstly aligned(S101). Alignment error is detected by measuring the alignment state of a mask to the first substrate(S102). The mask is secondly aligned to the first substrate based on the alignment error(S103). A first substrate is transferred to a next process(S1014). The mask is thirdly aligned to a second substrate(S105). The mask is contacted with the second substrate(S106).;COPYRIGHT KIPO 2011