X RAY MASK STRUCTURE, X RAY ALIGNER, X RAY EXPOSING METHOD USING THE X RAY ALIGNER, SEMICONDUCTOR DEVICE MANUFACTURE BY USING THE X RAY MASK STRUCTURE OR THE X RAY ALIGNER AND MANUFACTURE OF THE SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method which can correspond to prevention of dust adhesion to a mask and an aligner, prevents the mask surface from being contaminated, prolongs the life of a mask, and facilitates maintenance, in an X ray mask structure, an X ray aligner in which the X ray mask structure is assembled, an X ray exposing method using the X ray aligner, a semiconductor device and a manufacturing method of the semiconductor device. ;SOLUTION: In an X ray mask structure constituted of X ray absorber 3, a retaining film 2 retaining the absorber and a holding frame 1 holding the retaining film, suction ports 6 are formed in the X ray mask structure except a part used for exposure, and suction is performed from an X ray surface side as the side of a member to be transferred to the opposite side. Since the suction ports are formed on the surface, except a part used for exposure, of the X ray mask and an X ray aligner and suction is performed, all kinds of dusts such as organic material and metal are exhausted from the suction ports, and the X ray aligner can prevent dust from sticking to the mask and the aligner.;COPYRIGHT: (C)2000,JPO