首页> 外国专利> METHOD FOR MANUFACTURING A SEMICONDUCTOR WAFER CAPABLE OF PREVENTING DEFORMATION OF A SEMICONDUCTOR WAFER DURING CHUCK PROCESSSING

METHOD FOR MANUFACTURING A SEMICONDUCTOR WAFER CAPABLE OF PREVENTING DEFORMATION OF A SEMICONDUCTOR WAFER DURING CHUCK PROCESSSING

机译:制造能够防止卡盘过程中的半导体晶片变形的半导体晶片的方法

摘要

PURPOSE: A method for manufacturing a semiconductor wafer is provided to supply a new processing sequence to manufacture a semiconductor wafer whose diameter is 450mm.;CONSTITUTION: A semiconductor wafer is processed between two ring shaped rotation processing discs. Each processing disc comprises a processing layer with an abrasive. The edge of the semiconductor wafer is rounded by a grinding disc including an abrasive. The average particle size of the abrasive is from 1.0 to 20.0 micro meters.;COPYRIGHT KIPO 2011
机译:目的:提供一种制造半导体晶片的方法,以提供新的加工顺序来制造直径为450mm的半导体晶片。;组成:在两个环形旋转加工盘之间加工半导体晶片。每个处理盘包括带有磨料的处理层。半导体晶片的边缘通过包括磨料的研磨盘倒圆。磨料的平均粒径为1.0至20.0微米。; COPYRIGHT KIPO 2011

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号