METHOD FOR FABRICATING A PHASE INVERSION MASK, CAPABLE OF EASILY CONTROLLING THE CRITICAL DIMENSION OF A PHASE INVERSION FILM

摘要

PURPOSE: A method for fabricating a phase inversion mask is provided to secure the reproduction of the CRITICAL DIMENSION of a phase inversion film by processing surface treatment through plasma before etching the phase inversion film.;CONSTITUTION: In a method for fabricating a phase inversion mask, A phase inversion layer(210) and light shield layer are successively formed on a mask substrate(200). A first resist pattern limiting a circuit pattern on a light shield layer is formed. The mask substrate having the first resist pattern is surface-treated through plasma including oxygen and chlorine The light shield layer is etched using the first resist pattern as a mask to form a light shielding pattern(220a). A capping layer(240) is formed in the surface of the light shielding pattern.;COPYRIGHT KIPO 2011