LASER IRRADIATION APPARATUS, AN IRRADIATION METHOD THEREOF AND A CRYSTALLIZATION METHOD OF AN AMORPHOUS SILICON FILM USING THE SAME, HAVING AN OPTICAL SPEED CONTROL UNIT TO ADJUST THE SPEED OF A LASER BEAM

摘要

PURPOSE: A laser irradiation apparatus, an irradiation method thereof and a crystallization method of an amorphous silicon film using the same are provided to improve the uniformity of CRYSTALLIZATION of a polycrystalline silicon thin film by reducing the deviation of an irregular laser beam.;CONSTITUTION: In a laser irradiation apparatus, an irradiation method thereof and a crystallization method of an amorphous silicon film using the same, a laser generator(10) generates a pulse type laser beam. An optical system(20) modulates the laser beam to project it to a target. The optical system comprises a light division unit(30) and a flux controlling unit(40). The light division method comprises a plurality of mirrors(31~35). The flux controlling method controls the speed of each laser beam which is partitioned by the light division unit.;COPYRIGHT KIPO 2011