SUBSTRATE FOR BLANKMASK, BLANKMASK MANUFACTURED USING THE SAME AND A MANUFACTURING METHOD THEREOF, HAVING EXCELLENT FAILURE LEVEL AND SURFACE ROUGHNESS IN AN EXTENSION AREA

摘要

PURPOSE: A substrate for blankmask, blankmask manufactured using the same and a manufacturing method thereof are provided to implement a blank mask of excellent performance by applying a filter to a ground slurry unit and a discharge unit.;CONSTITUTION: In a substrate for blankmask, blankmask manufactured using the same and a manufacturing method thereof, A polishing slurry(200) is provided to the upper part of a polishing device(100) through the slurry supply unit. A grinding particle in a polishing slurry and foreign material are removed by a plurality of filter which is installed in the slurry supply unit. The polishing slurry supplied to the upper part of the polishing device is passed between an upper plate and a lower plate The used polishing slurry is returned into a slurry tank through a slurry discharge unit.;COPYRIGHT KIPO 2011