首页> 外国专利> ETCHANT FOR A METAL FILM OF A LIQUID CRYSTAL DISPLAY WITH EXCELLENT ETCHING UNFORMITY WHILE NOT GENERATING THE DAMAGES OF A PHOTORESIST LAYER USING COPPER IONS INSTEAD OF HYDROGEN PEROXIDE AS AN OXIDIZING AGENT

ETCHANT FOR A METAL FILM OF A LIQUID CRYSTAL DISPLAY WITH EXCELLENT ETCHING UNFORMITY WHILE NOT GENERATING THE DAMAGES OF A PHOTORESIST LAYER USING COPPER IONS INSTEAD OF HYDROGEN PEROXIDE AS AN OXIDIZING AGENT

机译:液态液晶显示器金属膜的蚀刻剂,具有出色的蚀刻不均匀性,而不会使用铜离子代替过氧化氢作为氧化剂产生光致抗蚀剂层的损伤

摘要

PURPOSE: An etchant for a metal film of a liquid crystal display is provided to maintain stable state without the composition change of etchant, to minimize lifetime reduction and capacity reduction, and to secure the uniformity of etching. ;CONSTITUTION: An etchant for a metal film of a liquid crystal display for etching a metal layer functioning as an electrode and a signal line including copper comprises: copper ions as an oxidizing agent; halogen ions; amines compound; organic acids; and etching inhibitors. The concentration of the copper ion is 0.5~20 weight%. The concentration of the halogen ion is 0.001~10 weight%. The concentration of the amines compound is 3~40 weight%. The concentration of the organic acid is 0.5~35 weight%. The concentration of the etching inhibitor is 0.001~5 weight%.;COPYRIGHT KIPO 2011
机译:目的:提供一种用于液晶显示器的金属膜的蚀刻剂,以保持稳定的状态而不会改变蚀刻剂的组成,以最小化寿命的减少和容量的减小,并确保蚀刻的均匀性。 ;组成:用于蚀刻用作电极的金属层和包括铜的信号线的液晶显示器的金属膜的蚀刻剂,包括:铜离子作为氧化剂;卤素离子胺类化合物有机酸和腐蚀抑制剂。铜离子的浓度为0.5〜20重量%。卤素离子的浓度为0.001〜10重量%。胺类化合物的浓度为3〜40重量%。有机酸的浓度为0.5〜35重量%。缓蚀剂的浓度为0.001〜5重量%。;COPYRIGHT KIPO 2011

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