RESIST SUBLAYER AROMATIC RING CONTAINING POLYMER AND A RESIST SUBLAYER COMPOSITION INCLUDING THE SAME CAPABLE OF IMPLEMENTING A COATING PROCESS USING A SPIN-ON COATING TECHNIQUE

摘要

PURPOSE: A resist sublayer aromatic ring containing polymer and a resist sublayer composition including the same are provided to secure the sufficient resistance characteristic with respect to multi-etching operations. ;CONSTITUTION: A resist sublayer aromatic ring containing polymer includes a structural unit represented by chemical formula 1. In the chemical formula 1, the p is the integer of 1 or 2. The q is the integer of 1 to 5. The k is the integer of 1 to 6. The value of q+k is the integer of 1 to 6. The X is hydroxyl group, substituted or non-substituted C1 to C10 alkoxy group, or substituted or non-substituted C6 to C30 aryloxy group. The Ra is substituted or non-substituted C1 to C10 alkyl group, substituted or non-substituted C3 to C8 cycloalkyl group, substituted or non-substituted C6 to C30 aryl group, substituted or non-substituted C2 to C10 alkenyl group, or halogen. The Rb is hydrogen, substituted or non-substituted C1 to C10 alkyl group, substituted or non-substituted C3 to C8 cycloalkyl group, or substituted or non-substituted C6 to C30 aryl group.;COPYRIGHT KIPO 2011