首页> 外国专利> MONOCRYSTAL GROWING APPARATUS AND MONOCRYSTAL GROWING METHOD AND AN INGOT AND WAFER WHICH ARE GROWN BY THE SAME

MONOCRYSTAL GROWING APPARATUS AND MONOCRYSTAL GROWING METHOD AND AN INGOT AND WAFER WHICH ARE GROWN BY THE SAME

机译:单晶生长装置,单晶生长方法以及由其生长的单块硅片和硅片

摘要

PURPOSE: A monocrystal growing apparatus and a monocrystal growing method are provided to use a method to easily control oxygen dissemination when separating a residual melt volume using a magnetic field, thereby enabling the efficient control of low oxygen, a crystal length direction, and a wafer in-plane oxygen deviation.;CONSTITUTION: A monocrystal growing apparatus includes a crucible and a magnet. The crucible is able to hold melt. The magnet is separated from the crucible and installed in the circumference of the crucible. The location of a magnet is controlled according to a ratio α of residual melt volume which is varying depending on the growth of a monocrystal ingot. The position of the magnet is determined by setting the ratio α of residual melt volume as 0.3 to 0.6. The ratio α equals to Va divided by Vt, here Vt is a total residual volume of the melt and Va is a residual volume of melt in a region higher than a maximum gauss position(MGP).;COPYRIGHT KIPO 2011
机译:用途:提供了一种单晶生长设备和单晶生长方法,以使用一种方法,该方法在利用磁场分离残余熔体体积时易于控制氧的扩散,从而能够有效地控制低氧,晶体长度方向和晶片平面内氧气偏差。;组成:单晶生长设备,包括坩埚和磁体。坩埚能够容纳熔体。磁体与坩埚分开并安装在坩埚的周围。磁体的位置根据比率α来控制。残余熔体体积的变化取决于单晶锭的生长。磁体的位置通过设置比率α来确定。残余熔体体积的0.3-0.6。比率α等于Va除以Vt,此处Vt是熔体的总残留量,Va是高于最大高斯位置(MGP)的区域中熔体的残留量。; COPYRIGHT KIPO 2011

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