METHOD FOR MANUFACTURING A POROUS CARBON STRUCTURE USING AN OPTICAL INTERFERENCE LITHOGRAPHY AND THE POROUS CARBON STRUCTURE CAPABLE OF BEING USED AS AN ELECTRODE SUPPORT OR A CATALYST SUPPORT

摘要

PURPOSE: A method for manufacturing a porous carbon structure using optical interference lithography and the porous carbon structure are provided to form a photo-resist pattern with three dimensional pore structures and carbonize the photo-resist pattern.;CONSTITUTION: A photo-resist layer(20) is formed on a substrate(10). A three dimensional porous photo-resist pattern is formed on the photo-resist layer based on a three-dimensional optical interference lithography. Inorganic materials(30) are coated on the three dimensional porous photo-resist pattern. The inorganic materials are carbonized by heating the photo-resist pattern. A porous carbon structure(40) is obtained by eliminating the coated inorganic materials.;COPYRIGHT KIPO 2011