PELLICLE FOR LITHOGRAPHY CAPABLE OF SUPPRESSING THE TWISTING PHENOMENON OF A MASK BASED ON THE SUPERIOR FLATNESS OF AN ADHESIVE LAYER

摘要

PURPOSE: A pellicle for lithography is provided to suppress the deformation of a mask due to the attachment of the pellicle by pressurizing a pellicle frame based on a uniform pressure when the pellicle is attached to the mask.;CONSTITUTION: A film adhesive(4) is formed at one side of a pellicle frame(2). A pellicle film(3) is bonded to the pellicle frame based on the adhesive. An adhesion layer(5) is formed at another side of the pellicle frame. The surface flatness of the adhesive layer is less than or equal to 10 um. A separator is attached to the adhesion layer. A concavo-convex part is capable of being formed on both sides of the pellicle frame.;COPYRIGHT KIPO 2011