首页> 外国专利> VAPOR DEPOSITION SYSTEM CAPABLE OF INCREASING THE CRYSTALLINE QUALITY OF A SEMICONDUCTOR LAYER, A LIGHT EMITTING DEVICE MANUFACTURING METHOD, AND A LIGHT EMITTING DEVICE

VAPOR DEPOSITION SYSTEM CAPABLE OF INCREASING THE CRYSTALLINE QUALITY OF A SEMICONDUCTOR LAYER, A LIGHT EMITTING DEVICE MANUFACTURING METHOD, AND A LIGHT EMITTING DEVICE

机译:可提高半导体层的结晶品质的蒸气沉积系统,发光装置的制造方法及发光装置

摘要

PURPOSE: A vapor deposition system, a light emitting device manufacturing method, and a light emitting device are provided to maintain the temperatures of first and second chambers uniform, thereby reducing deterioration of a device.;CONSTITUTION: A first chamber(101) comprises a first susceptor and at least one first gas distributor. The first gas distributor emits a gas in the direction parallel with a substrate(110). The substrate is arranged in the first susceptor. A second chamber(102) includes a second susceptor and at least one second gas distributor. The second gas distributor is arranged on the second susceptor to emit gas downward.;COPYRIGHT KIPO 2011
机译:目的:提供气相沉积系统,发光器件的制造方法和发光器件,以保持第一腔室和第二腔室的温度均匀,从而减少器件的劣化。;组成:第一腔室(101)包括一个第一基座和至少一个第一气体分配器。第一气体分配器沿平行于基板(110)的方向发射气体。基板布置在第一基座中。第二腔室(102)包括第二基座和至少一个第二气体分配器。第二个气体分配器布置在第二个基座上,以向下排放气体。; COPYRIGHT KIPO 2011

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