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VAPOR DEPOSITION SYSTEM CAPABLE OF INCREASING THE CRYSTALLINE QUALITY OF A SEMICONDUCTOR LAYER, A LIGHT EMITTING DEVICE MANUFACTURING METHOD, AND A LIGHT EMITTING DEVICE
VAPOR DEPOSITION SYSTEM CAPABLE OF INCREASING THE CRYSTALLINE QUALITY OF A SEMICONDUCTOR LAYER, A LIGHT EMITTING DEVICE MANUFACTURING METHOD, AND A LIGHT EMITTING DEVICE
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机译:可提高半导体层的结晶品质的蒸气沉积系统,发光装置的制造方法及发光装置
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摘要
PURPOSE: A vapor deposition system, a light emitting device manufacturing method, and a light emitting device are provided to maintain the temperatures of first and second chambers uniform, thereby reducing deterioration of a device.;CONSTITUTION: A first chamber(101) comprises a first susceptor and at least one first gas distributor. The first gas distributor emits a gas in the direction parallel with a substrate(110). The substrate is arranged in the first susceptor. A second chamber(102) includes a second susceptor and at least one second gas distributor. The second gas distributor is arranged on the second susceptor to emit gas downward.;COPYRIGHT KIPO 2011
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