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MATERIAL FOR MANUFACTURING TARGETS FOR PHYSICAL VAPOUR DEPOSITION OF P-TYPE TRANSPARENT CONDUCTIVE FILMS
MATERIAL FOR MANUFACTURING TARGETS FOR PHYSICAL VAPOUR DEPOSITION OF P-TYPE TRANSPARENT CONDUCTIVE FILMS
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机译:P型透明导电膜的物理气相沉积制造目标材料
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摘要
The invention describes a powderous oxide material (MxM′y)Cu2+a O2+b for the production of targets for p-type transparent conductive thin films, wherein −0.2≦̸a≦̸0.2, −0.2≦̸b≦̸0.2 and either —M′ is Sr and M is either one or both of Ba and bivalent Cu, with x0, y0 and x+y=1 ±0.2; or —M is bivalent Cu, x=1 ±0.2, and y=0.
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机译:本发明描述了一种用于生产p型透明导电薄膜的靶的粉末状氧化物材料(MxM y)Cu 2 + a O 2 + b,其中-0.2≦̸ a≦̸ 0.2,-0.2≦̸ b≦̸ 0.2以及— M′是Sr,M是Ba和二价Cu中的一个或两者,且x> 0,y> 0,x + y = 1±0.2;或M是二价Cu,x = 1±0.2,并且y = 0。
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