首页> 外国专利> DRUG SOLUTION CIRCULATION APPARATUS CAPABLE OF PREVENTING DAMAGE OF A WAFER, EFFECTIVELY WASHING THE WAFER, AND IMPROVING A LIFETIME AND A BUBBLE ELIMINATION APPARATUS

DRUG SOLUTION CIRCULATION APPARATUS CAPABLE OF PREVENTING DAMAGE OF A WAFER, EFFECTIVELY WASHING THE WAFER, AND IMPROVING A LIFETIME AND A BUBBLE ELIMINATION APPARATUS

机译:能够防止晶片损坏,有效地清洗晶片并改善使用寿命和消除气泡的装置的药物溶液循环装置

摘要

PURPOSE: A drug solution circulation apparatus and a bubble elimination apparatus are provided to easily filter the drug solution circulating through a circulation line, thereby improving a filter lifetime.;CONSTITUTION: A first bass accepts drug solution. The drug solution which is flowing out from the first bass is circulated through the first bass by a circulation line(300). A bubble elimination part(700) is included in the circulation line and eliminates bubbles included in the circulated drug solution. The bubble elimination part is arranged between a heater part and a filter part. The heater part heats the drug solution. The filter part filters the heated drug solution.;COPYRIGHT KIPO 2012
机译:目的:提供一种药液循环装置和消泡装置,以容易地过滤通过循环管线循环的药液,从而提高过滤器的使用寿命。;组成:第一低音接收药液。从第一贝斯流出的药液通过循环线(300)在第一贝斯中循环。气泡消除部(700)包括在循环管线中,并且消除了循环药物溶液中包含的气泡。气泡消除部布置在加热器部和过滤器部之间。加热器部分加热药液。过滤器部分过滤加热的药物溶液。; COPYRIGHT KIPO 2012

著录项

  • 公开/公告号KR20110099510A

    专利类型

  • 公开/公告日2011-09-08

    原文格式PDF

  • 申请/专利权人 LG SILTRON INCORPORATED;

    申请/专利号KR20100018577

  • 发明设计人 JUNG HONG IL;

    申请日2010-03-02

  • 分类号H01L21/302;H01L21/02;

  • 国家 KR

  • 入库时间 2022-08-21 17:51:12

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