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CRITICAL DIMENSION CORRECTING METHOD OF A CONTACT HOLE PATTERN WHICH CLASSIFIES BY MATCHING A RANDOM CONTACT HOLE ACCORDING TO THE SHAPE OF A SURROUNDING HOLE
CRITICAL DIMENSION CORRECTING METHOD OF A CONTACT HOLE PATTERN WHICH CLASSIFIES BY MATCHING A RANDOM CONTACT HOLE ACCORDING TO THE SHAPE OF A SURROUNDING HOLE
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机译:通过根据环绕孔的形状匹配随机接触孔来分类的接触孔图案的临界尺寸校正方法
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摘要
PURPOSE: A critical dimension(CD) correcting method of a contact hole pattern is provided to analyze the CD of a random contact hole, thereby effectively correcting a CD error of a random contact hole pattern.;CONSTITUTION: An original layout of a contact hole pattern is designed(110). The critical dimension(CD) of the contact hole pattern transferred on a wafer is floated by being measured(130). A contact hole in a region where a correction is required is selected(140). A GDS(Graphic Data System) image clip near a measurement hole is made(150). The GDS image clips are compared and matched in order to be grouped for similar hole types(160). CD errors are corrected for each classified group(170).;COPYRIGHT KIPO 2012
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