OPTICAL CRITICAL DIMENSION METROLOGY METHOD AND APPARATUS USING SPECTRAL INTERFEROMETRY

摘要

PURPOSE: An optical critical dimension metrology method and an apparatus using a spectral interferometry are provided to increase measuring speed while obtaining SE parameter through one single shot. CONSTITUTION: A first spectrometer(16) and a second spectrometer(17) are arranged. A light source(10) projects the white light. A polariscope(12) polarizes the white light from the light source to a TM polarizer and a direction of 45 degrees from the TM polarizer. A beam splitter(13) makes a polarized linear white light to a measurement object. An OCD interferometer(14) forms a light interference with a measured light reflected from the target and a reference light reflected from a reference mirror.