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ultra-nitrogen profile of the silicon oxynitride by a rapid thermal annealing using ammonia at low pressure tailoring
ultra-nitrogen profile of the silicon oxynitride by a rapid thermal annealing using ammonia at low pressure tailoring
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机译:使用氨在低压定制条件下通过快速热退火实现氮氧化硅的超氮分布
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摘要
A method of forming a dielectric film that includes nitrogen. The method includes incorporating nitrogen into a dielectric film using a nitridation gas and a rapid thermal annealing process, wherein an ultra-low pressure of equal to or less than about 10 Torr is used for the rapid thermal annealing process.
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