首页> 外国专利> PHOTOELECTRIC CONVERSION DEVICE, IMAGING SYSTEM, PHOTOELECTRIC CONVERSION DEVICE DESIGNING METHOD, AND PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING METHOD

PHOTOELECTRIC CONVERSION DEVICE, IMAGING SYSTEM, PHOTOELECTRIC CONVERSION DEVICE DESIGNING METHOD, AND PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING METHOD

机译:光电转换装置,成像系统,光电转换装置的设计方法以及光电转换装置的制造方法

摘要

PURPOSE: A photoelectric conversion device is provided to use an electric charge as a signal after generating the electric charge by converting a light irradiated to a device isolation part. CONSTITUTION: A photoelectric conversion device includes a plurality of photoelectric conversion part(27), a first reflection preventing part(106), and a second reflection preventing part(126). The photoelectric conversion part is arranged on a semiconductor substrate. The first reflection preventing part includes a first insulation film(107) and a second insulation film(108). The first insulation film is positioned on the photoelectric conversion part, has a first refractive index. The second insulation film is positioned on the first insulation film, and has a second refractive index.
机译:目的:提供一种光电转换装置,其通过将照射到器件隔离部分的光转换来产生电荷后,将电荷用作信号。构成:一种光电转换装置,包括多个光电转换部(27),第一防反射部(106)和第二防反射部(126)。光电转换部布置在半导体基板上。第一防反射部包括第一绝缘膜(107)和第二绝缘膜(108)。第一绝缘膜位于光电转换部上,具有第一折射率。第二绝缘膜位于第一绝缘膜上,并具有第二折射率。

著录项

  • 公开/公告号KR101068905B1

    专利类型

  • 公开/公告日2011-09-30

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20090028718

  • 发明设计人 시모츠사 미네오;

    申请日2009-04-03

  • 分类号H01L27/146;H04N5/335;

  • 国家 KR

  • 入库时间 2022-08-21 17:49:44

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