首页> 外国专利> Photoelectric conversion device, imaging system, photoelectric conversion device designing method, and photoelectric conversion device manufacturing method

Photoelectric conversion device, imaging system, photoelectric conversion device designing method, and photoelectric conversion device manufacturing method

机译:光电转换装置,成像系统,光电转换装置设计方法和光电转换装置制造方法

摘要

A photoelectric conversion device comprises a plurality of photoelectric conversion units, a first antireflection portion including a first insulation film which has a first refractive index and a second insulation film which has a second refractive index, and a second antireflection portion including an element isolation portion which includes an insulator having a third refractive index and a third insulation film which has the second refractive index, wherein the first antireflection portion reduces reflection of light entering the photoelectric conversion unit in the photoelectric conversion unit, and the second antireflection portion reduces reflection of light entering the element isolation portion in the element isolation portion.
机译:光电转换装置包括:多个光电转换单元;第一防反射部分,其包括具有第一折射率的第一绝缘膜和具有第二折射率的第二绝缘膜;以及第二防反射部分,其包括元件隔离部分,该元件隔离部分包括具有第三折射率的绝缘体和具有第二折射率的第三绝缘膜,其中第一抗反射部分减少光电转换单元中进入光电转换单元的光的反射,第二抗反射部分减少入射光的反射元件隔离部中的元件隔离部。

著录项

  • 公开/公告号US8274122B2

    专利类型

  • 公开/公告日2012-09-25

    原文格式PDF

  • 申请/专利权人 MINEO SHIMOTSUSA;

    申请/专利号US20090416994

  • 发明设计人 MINEO SHIMOTSUSA;

    申请日2009-04-02

  • 分类号H01L21/00;

  • 国家 US

  • 入库时间 2022-08-21 17:30:07

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号