Method for verification of optical proximity correct

摘要

The verification method of optical proximity effect correction of the present invention comprises the steps of: designing a layout of a target pattern; Performing optical proximity effect correction (OPC) on the designed layout; Performing first verification using the line width CD on the layout on which the optical proximity effect correction has been performed; Performing a second verification using a process window on the defect vulnerability point detected in the first verification; And further performing optical proximity effect correction on the point where the defect was detected in the secondary verification.;Validation, Linewidth, and Process Window