首页> 外国专利> Rotor disk set forming method for polishing semiconductor wafer, involves selecting one rotor disk based on material properties for rotor disk set, where characterization of selected rotor disk is marked by engraving identification mark

Rotor disk set forming method for polishing semiconductor wafer, involves selecting one rotor disk based on material properties for rotor disk set, where characterization of selected rotor disk is marked by engraving identification mark

机译:用于抛光半导体晶片的转子盘组形成方法,包括基于转子盘组的材料特性选择一个转子盘,其中通过雕刻识别标记来标记所选择的转子盘的特性。

摘要

The method involves determining material properties of rotor disks, and selecting one of the rotor disks based on the material properties for a rotor disk set. The material properties are determined by measuring or testing the rotor disks. Characterization of the selected rotor disk is marked by engraving an identification mark. The rotor disks are coated with a coating of diamond-like carbon. Marking of the rotor disks is updated in a case of selection of the rotor disks.
机译:该方法包括确定转子盘的材料特性,并且基于转子盘组的材料特性选择转子盘之一。材料性能是通过测量或测试转子盘来确定的。通过雕刻识别标记来标记所选转子盘的特征。转子盘上覆盖有类金刚石碳涂层。在选择转子盘的情况下更新转子盘的标记。

著录项

  • 公开/公告号DE102009022223A1

    专利类型

  • 公开/公告日2010-11-25

    原文格式PDF

  • 申请/专利权人 SILTRONIC AG;

    申请/专利号DE20091022223

  • 发明设计人 ZSCHOKE RUEDIGER;WALTER HOLGER;

    申请日2009-05-20

  • 分类号B24B7/17;B24B37/04;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:56

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