首页> 外国专利> Method for producing electrical interlayer connection in substrate of micro-component or sensor, involves opening mask layer over substrate area provided for electrical interlayer connection, where mask layer is applied on substrate

Method for producing electrical interlayer connection in substrate of micro-component or sensor, involves opening mask layer over substrate area provided for electrical interlayer connection, where mask layer is applied on substrate

机译:在微部件或传感器的基板中产生电层间连接的方法,包括在提供用于电层间连接的基板区域上方打开掩模层,其中在基板上施加掩模层

摘要

The method involves opening a mask layer over a substrate area provided for the electrical interlayer connection. The mask layer is applied on the substrate (10). A through-hole is generated in the substrate area and an electrical interlayer connection is inserted in the through-hole. The mask layer partially remains in the area of the through-hole during opening of the mask layer, generation of the through-hole and insertion of the electrical interlayer connection. An independent claim is also included for a substrate with an opening recess.
机译:该方法包括在提供用于电层间连接的衬底区域上方打开掩模层。掩模层被施加在基板(10)上。在衬底区域中产生通孔,并且将电层间连接插入到通孔中。在掩模层的打开,通孔的产生以及电层间连接的插入期间,掩模层部分地保留在通孔的区域中。对于具有开口凹槽的基板也包括独立权利要求。

著录项

  • 公开/公告号DE102009027321A1

    专利类型

  • 公开/公告日2011-01-05

    原文格式PDF

  • 申请/专利权人 ROBERT BOSCH GMBH;

    申请/专利号DE20091027321

  • 申请日2009-06-30

  • 分类号H01L21/283;H01L21/768;H01L23/482;H01L23/50;B81B7/02;

  • 国家 DE

  • 入库时间 2022-08-21 17:47:53

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号