Method for homogenizing reflectance losses of photodiodes in semiconductor device e.g. integrated circuit, involves providing transparent insulator layer over cathode surface of photodiodes

摘要

The method involves providing transparent insulator layer or transparent insulator layer stacks (10,11) with periodical layer thickness of 150 Nm. The transparent insulator layer is provided over cathode surface of photodiodes. An independent claim is included for semiconductor device.