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wu00e4rmesteuerung deposition in dpn (dip pen nanolithography)
wu00e4rmesteuerung deposition in dpn (dip pen nanolithography)
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机译:dpn中的w u00e4rmesteuerung沉积(浸笔纳米光刻)
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摘要
The invention discloses a device applied in the nano lithography a heat control method for making the solid organic ink deposit on the base-plate from the needlepoint of the atomic microscope. The invention can be used to start and stop the ink depositing on the base-plate by the means of increasing the temperature to higher than the fluxing temperature of the ink or decreasing the temperature to lower than the fluxing temperature of the ink. The allowance of the ink deposition can be started and stopped and the deposition rate can be changed without interruption of the contact between the needlepoint and base-plate, so that the method may be useful. Uniform needle points may used for imaging without pollution. The invention allows the ink deposition in the vacuum chamber. The invention obtains a higher spatial resolution when the ink has a lower surface mobility after cooling.
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