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process for the production of a thin film, including a step of korrigierens thickness by hilfsoxidation and associated device
process for the production of a thin film, including a step of korrigierens thickness by hilfsoxidation and associated device
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机译:薄膜的制造方法,包括通过半氧化法使柯氏变色的步骤及相关装置
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摘要
The invention relates to a method of preparing a thin layer of semiconductor material, the method including a step (1050') of correcting the thickness of the layer, said step of correcting thickness of the layer itself comprising the following operations: acquiring a measured thickness profile of the layer; deducing thickness correction specifications from the measured thickness profile; and correcting the thickness of the layer in accordance with said specifications; the method being characterized in that thickness correction implements a technique which simultaneously treats the entire surface of the layer, while locally and selectively adapt layer thickness in different regions of the layer surface. The invention also relates to an associated machine.
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