DEVICE OF MANUFACTURING MICROCRYSTAL SEMICONDUCTOR THIN FILM, AND METHOD OF MANUFACTURING MICROCRYSTAL SEMICONDUCTOR THIN FILM

摘要

PROBLEM TO BE SOLVED: To form a crystalline semiconductor thin film on a large-area substrate uniformly at a high speed.;SOLUTION: A device of manufacturing a microcrystal semiconductor thin film has: a vacuum container 10; an electrode 12 provided so as to be opposed to a substrate 100; gas supply means 22a, 22b, and 22c continuously supplying gas containing hydrogen as a main component into the vacuum container 10 at a constant rate; gas supply means 22d, 22e, and 22f supplying a semiconductor material gas individually and periodically for each divided region to the divided regions obtained by dividing a space between the substrate 100 and the electrode 12 into a plurality of parts in a plane of the substrate 100; high-frequency power supplies 40a, 40b, and 40c applying high-frequency voltages individually to regions corresponding to the divided regions to which the semiconductor material gas in the electrode 12 is supplied, in synchronization with the supply of the semiconductor material gas; control means 60 controlling on/off of the supply of the semiconductor material gas to the divided regions, and adding amplitude modulation to the high-frequency voltages to be applied to the electrode 12 in synchronization with the supply of the semiconductor material gas; and exhaust means 20 exhausting the gas in the vacuum container 10.;COPYRIGHT: (C)2012,JPO&INPIT