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The center which was formed with the silica where being the method of producing the structure of the flat type which is formed the flat type structure null which it produces from use, and especially silicon of method and the aforementioned method of producing
The center which was formed with the silica where being the method of producing the structure of the flat type which is formed the flat type structure null which it produces from use, and especially silicon of method and the aforementioned method of producing
This invention those by especially silicon in regard to the structure of the flat type which is produced with method and this method of producing the structure of flat type, regards. At least one baseplate (2) and is allotted between upper layer (3) and the baseplate and upper layer one which center (4) it possesses the structure which depends on invention, at least. The above-mentioned center (4) the atom or the molecule of the substance of the baseplate at least has had one where the exogenous molecule or the atom which differs is arranged basic substance. According to this invention, center (4) is deformation possible plastically, by the exogenous molecule or the existence of the atom where the inside of the basic substance which is selected is selected, the minute bubble or the minute air gap (7), the kind of heat treatment which causes irreversible formation it is done at the intermediate inside layer vis-a-vis the plate. Selective figure Figure 3
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