Film thickness evaluation apparatus and film thickness evaluation method

摘要

Provided is a film thickness evaluation device capable of evaluating, at a high resolution, the film thickness distribution of an insulator layer formed on a conductor surface.  The film thickness evaluation device, while scanning a probe over a sample surface, obtains the absolute value of film thickness from the square root of the reciprocal of a two time-differential signal associated with the voltage corresponding to the electrostatic force acting between the probe and the sample and a differential signal associated with the distance between the probe and the sample.  The film thickness evaluation device then performs mapping of the film thickness.