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Production method of passage baseplate, production method of liquid drop emission head and production methodological null nozzle hole of liquid

机译:通道基板的制造方法,液滴喷射头的制造方法以及液体的空喷嘴孔的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for a channel substrate in which nozzles can be highly precisely machined and formed to a silicon substrate to be the channel substrate while a reservoir capacity sufficient for prevention of cross talk is secured, and to provide a manufacturing method for a liquid droplet ejection head, and a manufacturing method for a liquid droplet ejector.;SOLUTION: In the manufacturing method for the channel substrate 1, a liquid channel comprised of a nozzle hole 11, a cavity 12 and a reservoir 13 with a predetermined capacity is formed to a channel substrate base material consisting of a single silicon substrate. When part for forming the nozzle hole 11, cavity 12 and reservoir 13 is etched from one surface of the channel substrate base material to a predetermined depth, a through-hole part for alignment penetrating the channel substrate base material is formed simultaneously. After the nozzle hole is etched to the predetermined depth, the channel substrate base material is aligned, and the nozzle hole is made to pierce from the other surface of the channel substrate base material.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于沟道基板的制造方法,其中,可以在确保足够的防止串扰的储存容量的同时,将喷嘴高精度地加工并形成为要成为沟道基板的硅基板,并且提供一种沟道基板的制造方法。解决方案:在通道基板1的制造方法中,液体通道包括喷嘴孔11,腔体12和带有凹槽的容器13对由单个硅基板组成的沟道基板基材形成预定的容量。当将用于形成喷嘴孔11的部分从通道基板母材的一个表面蚀刻至预定深度时,同时形成用于对准而贯穿通道基板母材的通孔部。在将喷嘴孔蚀刻至预定深度后,将通道基板的基材对齐,并使喷嘴孔从通道基板的另一表面刺穿。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP4894603B2

    专利类型

  • 公开/公告日2012-03-14

    原文格式PDF

  • 申请/专利权人 セイコーエプソン株式会社;

    申请/专利号JP20070118107

  • 发明设计人 大谷 和史;荒川 克治;

    申请日2007-04-27

  • 分类号B41J2/16;B41J2/135;B41J2/045;B41J2/055;

  • 国家 JP

  • 入库时间 2022-08-21 17:38:00

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