The thin film formation device, thin film formation manner and polarization reversal possible conversion manner, evaporating the fluoridation vinylidene oligomer

摘要

PROBLEM TO BE SOLVED: To provide an apparatus 1 for thin film formation, capable of efficiently forming a thin film 51 in a short period of time.;SOLUTION: An evaporation source 30 in which a VDF oligomer 33 is disposed and a substrate 10 to be subjected to vapor deposition are separated from each other while the evaporation source 30 is heated. Then, a separated state in which the substrate 10 and the evaporation source 30 are separated from each other is shifted into a neighboring state in which a thin film formation surface 11 of the substrate 10 and a VDF oligomer supplying surface 32 of the evaporation source 30 come close to and face each other across a heat-insulating mask 20 by moving the substrate 10 and/or the evaporation source 30. In the neighboring state, the thin film 51 of the VDF oligomer 33 is deposited onto the thin film formation surface 11.;COPYRIGHT: (C)2009,JPO&INPIT