Amendment manner of uneven reticule heating inside lithography device, lithography device, and computer reading type storage.

摘要

PROBLEM TO BE SOLVED: To provide a method for correcting uneven reticle heating.;SOLUTION: The method includes: controlling an emission beam; imparting a pattern to the emission beam by a reticle having a pattern image area and a reticle mark so as to form an emission beam with the pattern; and projecting the emission beam with the pattern on a target part of a substrate through a projection system. The method includes lighting the reticle mark with the emission beam so as to generate a spatial image of the reticle; projecting the spatial image on an image sensor; gathering image data from the image sensor; acquiring position parameters of the spatial image from the image data; and compensating thermal expansion of the reticle induced by the lighting with estimated correction values of magnification settings of the projection system so as to correct arbitrary deviations of the position parameters from a necessary position of the spatial image, the estimated correction values being calculated by predicting temporal thermal expansion of the reticle.;COPYRIGHT: (C)2010,JPO&INPIT