The cleaning method of the magnetic film processing chamber, the manufacturing method of the magnetic element, and a substrate processing apparatus

摘要

Method of producing a multilayer film can be shortened, a method of manufacturing a magnetoresistive element, and the present invention provides a substrate processing apparatus of the cleaning process time. In one embodiment, I cleaned by plasma of a mixed gas containing O ₂ gas and H ₂ gas in between the process etching apparatus in the present invention. Thus, the cleaning time is reduced, productivity is improved.