Irradiating the pulse laser light which is excimer

摘要

PROBLEM TO BE SOLVED: To ensure uniform crystallization regardless of variations in laser output during laser annealing.;SOLUTION: A laser anneal processing method radiates pulse laser beams on a non-single crystal semiconductor film to perform anneal processing, wherein the pulse laser beams are energy-controlled such that the maximum peak height of pulse waveform of the laser beams reach a given height. The control is performed by a laser anneal device that includes: a laser oscillator 1 for outputting pulse laser beams; an optical system 4 for guiding pulse laser beams to the non-single crystal semiconductor film; a maximum peak height measurement unit for measuring the maximum peak height of the pulse laser beams; and a control unit 8 that controls a variable attenuator 2 for adjusting output energy of the pulse laser beams in the laser oscillator or attenuation ratio of the pulse laser beams such that the maximum peak height reaches a given height in response to the measurement result by the maximum peak height measurement unit.;COPYRIGHT: (C)2010,JPO&INPIT