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The surface roughness which is decreased (surface roughness) it is on
The surface roughness which is decreased (surface roughness) it is on
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机译:被降低的表面粗糙度(表面粗糙度)
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摘要
Nickel silicide formation with significantly reduced interface roughness is achieved by forming a diffusion modulating layer between the underlying silicon and nickel silicide layers. Embodiments include ion implanting nitrogen into the substrate and gate electrode, depositing a thin layer of titanium or tantalum, depositing a layer of nickel, and then heating to form a diffusion modulating layer containing nitrogen at the interface between the underlying silicon and nickel silicide layers.
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