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Independent monocrystal production manner of III group nitride and the layered product which includes III group nitride monocrystal formation

机译:III族氮化物和包括III族氮化物单晶形成的层状产物的独立单晶生产方式

摘要

P To provide a method for producing a single crystal in an independent state of an AlN-containing AlN based group III nitride by a simple method. PSOLUTION: A first intermediate layer 4 is formed ON a base substrate 3 in which a growing base layer 2 of AlN is formed ON a sapphire base material 1, and an AlN single crystal layer 7 is further formed by an HVPE (hydride vapor phase epitaxy) process and so as to obtain a stacked body 10. In this case and the first intermediate layer 4 is formed by a substance having a decomposition temperature lower than that of the single crystal layer 7, preferably and by a group III nitride such as AlGaN. When the stacked body 10 is heated at a temperature higher than the decomposition temperature of the first intermediate layer 4 and lower than the decomposition temperature of the single crystal layer 7, e.g., to 1,650° C, the first intermediate layer 4 is decomposed away and thus an AlN based group III nitride single crystal 7a in an independent state composed mainly of the part of the AlN single crystal layer 7 can be obtained. PCOPYRIGHT: (C)2007 and JPO& INPIT
机译:

提供一种通过简单的方法来制造含AlN的AlN系III族氮化物的独立状态的单晶的方法。

解决方案:第一中间层4形成在基底基板3上,其中在蓝宝石基底材料1上形成AlN生长的基底层2,并且进一步通过HVPE(氢化物)形成AlN单晶层7气相外延)工艺,从而获得层叠体10。在这种情况下,第一中间层4由分解温度低于单晶层7的物质形成,并且优选地由III族氮化物形成。例如AlGaN。当在高于第一中间层4的分解温度并且低于单晶层7的分解温度的温度下加热堆叠体10时,例如,将其加热到1650℃。接着,如图1C所示,第一中间层4被分解,从而能够得到以AlN单晶层7的一部分为主成分的独立状态的AlN系III族氮化物单晶7a。

版权:(C)2007和JPO&INPIT

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