Stripper containing acetal or ketal for removing post-etch photoresist, etching and polymer residues

摘要

PROBLEM TO BE SOLVED: To provide prescription including acetal or ketal as a solvent, water, and pH adjusters.;SOLUTION: The pH of these defoaming agents must be at least 7 or more. The prescription in this invention can optionally include a water-miscible organic solvent as a co-solvent, a corrosion inhibitor, and fluorides. The prescription can be used to remove not only a polymer residue, but also post-etched organic and inorganic residues from a semiconductor base.;COPYRIGHT: (C)2008,JPO&INPIT