Being production manner of the MoNb sputtering target material which

摘要

PROBLEM TO BE SOLVED: To provide a method for producing an MoNb based sputtering target material where production of splashes upon sputtering film deposition is remarkably reduced.;SOLUTION: The method for producing an MoNb based sputtering target material having a composition comprising 0.5 to 50 atomic% Nb, and the balance Mo with inevitable impurities comprises: a stage where an Mo primary sintered compact obtained by sintering Mo raw material powder is produced; a stage where the Mo primary sintered compact is pulverized so as to produce Mo secondary powder; a stage where the Mo secondary power is heat-treated in a reducing atmosphere so as to produce reduction-treated Mo powder; and a stage where a powdery mixture obtained by mixing the reduction-treated Mo powder and Nb raw material powder is subjected to pressure-sintering so as to produce an MoNb sintered compact.;COPYRIGHT: (C)2009,JPO&INPIT