首页> 外国专利> MULTI-ANGLE HARD BIAS DEPOSITION FOR OPTIMAL HARD-BIAS DEPOSITION IN A MAGNETIC SENSOR

MULTI-ANGLE HARD BIAS DEPOSITION FOR OPTIMAL HARD-BIAS DEPOSITION IN A MAGNETIC SENSOR

机译:磁传感器中最佳硬偏置沉积的多角度硬偏置沉积

摘要

A method for manufacturing a magnetic sensor that result in improved magnetic bias field to the sensor, improved shield to hard bias spacing and a flatter top shield profile. The method includes a multi-angled deposition of the hard bias structure. After forming the sensor stack a first hard bias layer is deposited at an angle of about 70 degrees relative to horizontal. This is a conformal deposition. Then, a second deposition is performed at an angle of about 90 degrees relative to horizontal. This is a notching deposition, that results in notches being formed adjacent to the sensor stack. Then, a hard bias capping layer is deposited at an angle of about 55 degrees relative to horizontal. This is a leveling deposition that further flattens the surface on which the top shield can be electroplated.
机译:一种用于制造磁传感器的方法,该方法导致对传感器的磁偏磁场的改善,对硬偏置间隔的改进的屏蔽以及较平的顶部屏蔽轮廓。该方法包括硬偏置结构的多角度沉积。在形成传感器叠层之后,相对于水平以大约70度的角度沉积第一硬偏置层。这是保形沉积。然后,以相对于水平约90度的角度执行第二沉积。这是一个凹口沉积,导致在传感器堆栈附近形成凹口。然后,以相对于水平约55度的角度沉积硬偏置覆盖层。这是一种流平沉积,可进一步平坦化可在其上电镀顶部护罩的表面。

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