首页> 外国专利> METAL DIFFRACTION GRATING WITH HIGH REFLECTION RESISTANCE TO A FEMTOSECOND MODE FLOW, SYSTEM INCLUDING SUCH AN GRATING, AND METHOD FOR IMPROVING THE DAMAGE THRESHOLD OF A METAL DIFFRACTION GRATING

METAL DIFFRACTION GRATING WITH HIGH REFLECTION RESISTANCE TO A FEMTOSECOND MODE FLOW, SYSTEM INCLUDING SUCH AN GRATING, AND METHOD FOR IMPROVING THE DAMAGE THRESHOLD OF A METAL DIFFRACTION GRATING

机译:对具有次幂模式流动的系统具有高反射阻力的金属衍射光栅,包括此类光栅的系统,以及提高金属衍射光栅的损伤阈值的方法

摘要

A reflection metal diffraction grating has a high diffraction efficiency for diffracting femtosecond mode laser pulses, and includes a substrate with a set of lines having a pitch Λ. The substrate is made of metal or covered with a metal layer, and the grating includes a thin film of dielectric material having a thickness, the dielectric film covering the metal surface of the lines of the grating, the grating being suitable for receiving a pulsed electromagnetic lightwave in a femtosecond mode. The thickness of the dielectric thin film is lower than 50 nm, and is suitable for reducing by a third order factor at least the maximum of the square of the electric field of the electromagnetic lightwave on the metal surface and in the metal layer of the substrate as compared to the square of the electric field at the surface of a metal grating not having a dielectric thin film.
机译:反射金属衍射光栅具有用于衍射飞秒模式激光脉冲的高衍射效率,并且包括具有一组具有间距Λ的线的基板。衬底由金属制成或覆盖有金属层,并且光栅包括具有一定厚度的电介质材料的薄膜,该电介质膜覆盖光栅的线的金属表面,该光栅适合于接收脉冲电磁波。飞秒模式下的光波。介电薄膜的厚度小于50nm,并且适合于以三阶因子减小至少在金属表面和基板的金属层中的电磁波的电场的平方的最大值。与不具有介电薄膜的金属光栅表面的电场平方相比。

著录项

  • 公开/公告号US2012093191A1

    专利类型

  • 公开/公告日2012-04-19

    原文格式PDF

  • 申请/专利权人 FREDERIC DESSEROUER;

    申请/专利号US201013318170

  • 发明设计人 FREDERIC DESSEROUER;

    申请日2010-04-28

  • 分类号H01S5/50;B05D5/06;G02B5/18;

  • 国家 US

  • 入库时间 2022-08-21 17:33:49

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