首页> 外国专利> Metal diffraction grating with reflection resistance to flow in the femtosecond range, a system comprising such a grating, and a method for improving the damage threshold of a metal diffraction grating.

Metal diffraction grating with reflection resistance to flow in the femtosecond range, a system comprising such a grating, and a method for improving the damage threshold of a metal diffraction grating.

机译:具有在飞秒范围内流动的反射阻力的金属衍射光栅,包括该光栅的系统以及用于提高金属衍射光栅的损伤阈值的方法。

摘要

A reflection metal diffraction grating has a high diffraction efficiency for diffracting femtosecond mode laser pulses, and includes a substrate with a set of lines having a pitch A. The substrate is made of metal or covered with a metal layer, and the grating includes a thin film of dielectric material having a thickness, the dielectric film covering the metal surface of the lines of the grating, the grating being suitable for receiving a pulsed electromagnetic lightwave in a femtosecond mode. The thickness of the dielectric thin film is lower than 50 nm, and is suitable for reducing by a third order factor at least the maximum of the square of the electric field of the electromagnetic lightwave on the metal surface and in the metal layer of the substrate as compared to the square of the electric field at the surface of a metal grating not having a dielectric thin film.
机译:反射金属衍射光栅具有用于衍射飞秒模式激光脉冲的高衍射效率,并且包括具有一组具有间距A的线的基板。该基板由金属制成或覆盖有金属层,并且该光栅包括薄的具有一定厚度的介电材料膜,该介电膜覆盖光栅的线的金属表面,该光栅适合于接收飞秒模式的脉冲电磁波。介电薄膜的厚度小于50nm,并且适合于以三阶因子减小至少在金属表面和基板的金属层中的电磁波的电场的平方的最大值。与不具有介电薄膜的金属光栅表面的电场平方相比。

著录项

  • 公开/公告号DK2425283T3

    专利类型

  • 公开/公告日2019-10-07

    原文格式PDF

  • 申请/专利权人 HORIBA FRANCE SAS;

    申请/专利号DK20100727056T

  • 发明设计人 DESSEROUER FRÉDÉRIC;

    申请日2010-04-28

  • 分类号G02B5/18;H01S3;H01S3/08;H01S3/23;

  • 国家 DK

  • 入库时间 2022-08-21 12:02:45

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