首页>
外国专利>
HYBRID LITHOGRAPHIC METHOD FOR FABRICATING COMPLEX MULTIDIMENSIONAL STRUCTURES
HYBRID LITHOGRAPHIC METHOD FOR FABRICATING COMPLEX MULTIDIMENSIONAL STRUCTURES
展开▼
机译:制造复杂多维结构的混合光刻技术
展开▼
页面导航
摘要
著录项
相似文献
摘要
Lithographic Method. The method fabricates complex structures and includes depositing a photoresist onto a substrate, the photoresist including a predominantly thermal band of optical absorption possibly due to the incorporation of a doping agent. A three-dimensional pattern is generated within the resist using a first wavelength of light to effect activation of a photoinitiator to produce a latently photostructured resist. Focused laser spike annealing of the photostructured resist with a second wavelength of light selected to be absorbed by the thermally absorbing band to accelerate the photoinduced reaction in the resist is provided. Three-dimensional direct writing may be performed within the resist to define features not part of the interference pattern and the resist is developed to produce the complex structure.
展开▼