首页> 外国专利> Silicon nitride layer for light emitting device, light emitting device using the same, and method of forming silicon nitride layer for light emitting device

Silicon nitride layer for light emitting device, light emitting device using the same, and method of forming silicon nitride layer for light emitting device

机译:用于发光器件的氮化硅层,使用该氮化硅层的发光器件以及形成用于发光器件的氮化硅层的方法

摘要

Provided are a silicon nitride layer for a light emitting device, light emitting device using the same, and method of forming the silicon nitride layer for the light emitting device. The silicon nitride layer of the light emitting device includes a silicon nitride matrix and silicon nanocrystals formed in the silicon nitride matrix. A light emitting device manufactured by the silicon nitride layer has a good luminous efficiency and emits light in the visible region including the short-wavelength blue/violet region and the near infrared region.
机译:提供了一种用于发光器件的氮化硅层,使用该氮化硅层的发光器件以及形成用于该发光器件的氮化硅层的方法。发光器件的氮化硅层包括氮化硅基质和形成在氮化硅基质中的硅纳米晶体。由氮化硅层制造的发光器件具有良好的发光效率,并且在包括短波长蓝/紫区域和近红外区域的可见区域中发光。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号